NALIN KUMAR
Partial List of Publications
M. S. Chung, N. M. Miskovsky, P. H. Cutler, Nalin Kumar, V. Patel, “Theoretical Analysis of a Field Emission Enhanced Semiconductor Thermoelectric Cooler”, accepted for publication in Solid State Electronics, 2003.
P. H. Cutler, N. M. Miskovsky, N. Kumar, and M. S. Chung, “New results on microelectronic cooling using the inverse Nottingham effect”, Cold Cathodes Proceedings, Vol. 2000-28 of the Electrochemical Society, 98-114 (2001).
M. S. Chung, N. M. Miskovsky, P. H. Cutler, and N. Kumar, “Band structure calculation of field emission from AlxGa1-xN as a function of stoichiometry”, Appl. Phys. Lett 76, 1143 (2000).
S. Jacobsen, S. Yang, F. Zhang, C. Summers, C. Bojkov, N. Kumar, L. Fredin and H. Schmidt, ‘Improved Performance of Low Voltage Phosphors for Field Emission Displays’, presented at the 1995 SID Display Manufacturing Research Conference, Santa Clara, January 1995.
C. Bojkov, N. Kumar, S. Jacobsen, S. Yang, and C. Summers, Proc. 1995 SID Asia Display, Hamamatsu, Japan, October 16-18, 1995, pp S26-1.
R.L. Fink, C. Xie, C.N. Potter, B. Lin, N. Kumar, H.K. Schmidt, L. Fredin, W. Brookover and R. Miller, 'Optimization of Amorphic diamond for diode field emission displays', Proc. of Society for Information Display Conference Technical Digest 1995.
N. Kumar et al., 'Development of nano-crystalline diamond based field emission displays', Proc. of Society for Information Display Conference Technical Digest, pp 43-46 (1994).
C. Xie and N. Kumar, 'Use of diamond thin films for low cost field emission displays', 7th International Vacuum Microelectronics Conference Technical Digest, pp 229-232 (1994).
N. Kumar, C. Xie, N. Potter, A. Krishnan, C. Hilbert, D. Eichman, E. Schlam, H. Schmidt and S. Wagal, 'Field Emission Displays Based on Diamond Thin Films', Proc. of Society for Information Display Conference Technical Digest, pp 1009-1010 (1993).
C. Xie and N. Kumar, Electron emission from amorphic diamond thin films', 6th International Vacuum Microelectronics Conference Technical Digest, pp 162-163 (1993).
N. Kumar, K. Pourrezaei and M. Ihsan, ' Summary Abstract: Aluminum deposition on optical fiber by a hollow cathode magnetron sputtering system', J. Vac. Sci. Technol. A 6 (3), 1772 (1988).
M. S. Chung, N. M. Miskovsky, P. H. Cutler, and N. Kumar, “The effect of stoichiometry and doping on the field emission characteristics of the ternary alloys, AlxGa1-xN”, J. Vac. Sci. Technol. B18, 919 (2000).
N. Kumar, J.T. McGinn, K. Pourrezaei, B. Lee and E.C. Douglas, 'Transmission electron microscopy studies of brown and golden titanium nitride thin films as diffusion barriers in very large scale integrated circuits,' J. Vac. Sci. Technol. A 6 (3), 1602 (1988).
B. Lee, E.C. Douglas, K. Pourrezaei and N. Kumar, ' Effect of oxygen on the diffusion barrier properties of TiN', Proc. 4th Int. IEEE VLSI Interconn. Conf., Santa Clara, CA, June 15-16, 1987, pp 344-350.
N. Kumar, B. Lee, K. Pourrezaei, M.G. Fissel and E.C. Douglas, "Application of TiN and TiOxNy thin film diffusion barriers in SOS integrated circuits", Proc. Of International Plasma Applications and Technology Conference, Brighton, UK, May 27-29, 1987.
N. Kumar, M.G. Fissel, K. Pourrezaei, B. Lee and E.C. Douglas, Thin Solid Films, 153, 287 (1987).
N. Kumar, K. Pourrezaei, M. Fissel, T. Begley, B. Lee and E.C. Douglas, J. Vac. Sci. Technol. A, 5 (4), Pt. III, 1778 (1987).
N. Kumar, K. Pourrezaei, R.J. DeMaria and B. Singh, 'Deposition of aluminum nitride films using RF reactive sputtering', Mat. Res. Soc. Symp. Proc. Vol. 68, 357 (1986).
